Provides a next generation solution for designing advanced semiconductors in the ‘sub wavelength,’ low k 1 era – 45nm and beyond. Tela’s focus is to innovate in the area of physical IC design to enable improved optimization of IC manufacturing processes. Unlike many Design for Manufacturing (DFM) approaches that look to “fix” a design, Tela is focused on creating a design methodology upfront that is highly manufacturable in a given lithography system.